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Atmospheric‐Pressure Plasmas for Solar Cell Manufacturing
I. Dani, G. Mäder, P. Grabau, B. Dresler, D. Linaschke, E. Lopez, S. Kaskel and E Beyer Contributions to Plasma Physics 49(9) 662 (2009) https://doi.org/10.1002/ctpp.200910071
LARGE—A Plasma Torch for Surface Chemistry Applications and CVD Processes—A Status Report
Stephan Zimmermann, Eckart Theophile, Klaus Landes and Jochen Schein Journal of Thermal Spray Technology 17(5-6) 617 (2008) https://doi.org/10.1007/s11666-008-9267-0
PECVD and plasma etching at atmospheric pressure by means of a linearly-extended DC arc plasma source
Ines Dani, Volkmar Hopfe, Daniela Rogler, Elena Lopez and Gerrit Mäder Vakuum in Forschung und Praxis 19(S1) 12 (2007) https://doi.org/10.1002/vipr.200790035
Atmospheric-Pressure PECVD Coating and Plasma Chemical Etching for Continuous Processing
Plasmachemische Gasphasenabscheidung und Plasmaätzen bei Atmosphärendruck
Ines Dani, Volkmar Hopfe, Daniela Rogler, Elena Lopez and Gerrit Mäder Vakuum in Forschung und Praxis 18(4) 30 (2006) https://doi.org/10.1002/vipr.200600294
Linear Extended ArcJet‐CVD – a New PECVD Approach for Continuous Wide Area Coating Under Atmospheric Pressure
V. Hopfe, D. Rogler, G. Maeder, I. Dani, K. Landes, E. Theophile, M. Dzulko, C. Rohrer and C. Reichhold Chemical Vapor Deposition 11(11-12) 510 (2005) https://doi.org/10.1002/cvde.200406343
CIPASS — An ignition method for the innovative plasma torch “LARGE”