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Cited article:

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Atmospheric‐Pressure Plasmas for Solar Cell Manufacturing

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LARGE—A Plasma Torch for Surface Chemistry Applications and CVD Processes—A Status Report

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PECVD and plasma etching at atmospheric pressure by means of a linearly-extended DC arc plasma source

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Vakuum in Forschung und Praxis 19 (S1) 12 (2007)
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Atmospheric‐Pressure Plasmas for Wide‐Area Thin‐Film Deposition and Etching

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Plasmachemische Gasphasenabscheidung und Plasmaätzen bei Atmosphärendruck

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Linear Extended ArcJet‐CVD – a New PECVD Approach for Continuous Wide Area Coating Under Atmospheric Pressure

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CIPASS — An ignition method for the innovative plasma torch “LARGE”

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