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Cited article:

Thermodynamical computation and physicochemical characterization of thin films deposited by electric-discharge-assisted chemical vapor deposition

Z Sassi, K Chafik, J.C Bureau, A Glachant and B Balland
Applied Surface Science 193 (1-4) 26 (2002)
https://doi.org/10.1016/S0169-4332(01)01030-3