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Cited article:

Employing Ion-Beam Sputter Deposited TiO2 Buffer Layers for VO2-Related Devices

Martin Becker, Florian Kuhl, Jonas Hauptmann, Jill Kessler, Sebastian L. Benz, Sangam Chatterjee, Angelika Polity and Peter J. Klar
ACS Applied Electronic Materials 5 (7) 3560 (2023)
https://doi.org/10.1021/acsaelm.3c00199