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Cited article:

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Comparison of the Material Quality of AlxIn1−xN (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering

Michael Sun, Rodrigo Blasco, Julian Nwodo, María de la Mata, Sergio I. Molina, Akhil Ajay, Eva Monroy, Sirona Valdueza-Felip and Fernando B. Naranjo
Materials 15 (20) 7373 (2022)
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Low‐to‐Mid Al Content (x = 0–0.56) AlxIn1−xN Layers Deposited on Si(100) by Radio‐Frequency Sputtering

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physica status solidi (b) 257 (4) (2020)
https://doi.org/10.1002/pssb.201900575

Aluminium nitride cubic modifications synthesis methods and its features. Review

V.S. Kudyakova, R.A. Shishkin, A.A. Elagin, M.V. Baranov and A.R. Beketov
Journal of the European Ceramic Society 37 (4) 1143 (2017)
https://doi.org/10.1016/j.jeurceramsoc.2016.11.051

THERMALLY-DRIVEN STRUCTURAL CHANGES OF SPUTTERED COPPER ALUMINUM OXIDE FILMS (Cu–Al2O3) GROWN BY LAYER STACKING METHOD

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Surface Review and Letters 24 (Supp01) 1850002 (2017)
https://doi.org/10.1142/S0218625X18500026

Growth of AlInN films via elemental layers annealing at different temperatures

Naveed Afzal, Mutharasu Devarajan and Kamarulazizi Ibrahim
Modern Physics Letters B 29 (28) 1550169 (2015)
https://doi.org/10.1142/S0217984915501699