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All issues Eur. Phys. J. Appl. Phys., 67 1 (2014) 10801 Article references

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Cited article:

Comparative Study of Influence of Experimental Configuration on Densities of Active Species in the Early Afterglows of N2/(0–2.5%)H2 HF Flowing Plasmas

M. Abdeladim, J. P. Sarrette, J. Amorim and A. Ricard
Plasma Chemistry and Plasma Processing 42 (5) 1201 (2022)
https://doi.org/10.1007/s11090-022-10272-0

Controlling N and C-atom densities in N2/H2 and N2/CH4 microwave afterglows for selective TiO2 surface nitriding

Andre Ricard, Yunfei Wang, Yoon Sang Lee, et al.
Applied Surface Science 540 148348 (2021)
https://doi.org/10.1016/j.apsusc.2020.148348

The role of hydrogen in the nitriding of anatase TiO2 films in the N2-H2 microwave afterglows

Seol Ryu, Yunfei Wang, Andre Ricard, et al.
Surface and Coatings Technology 364 341 (2019)
https://doi.org/10.1016/j.surfcoat.2019.03.011

Densities of Active species in N2/H2 RF and HF afterglows: application to surface nitriding of TiO2 nanocrystals

André Ricard, Jean-Philippe Sarrette, Yunfei Wang, et al.
The European Physical Journal Applied Physics 80 (1) 10801 (2017)
https://doi.org/10.1051/epjap/2017170189

The role of active species in the N 2 and N 2 -H 2 RF afterglows on selective surface nitriding of ALD-grown TiO 2 films

Yunfei Wang, Andre Ricard, Jean-Philippe Sarrette, Ansoon Kim and Yu Kwon Kim
Surface and Coatings Technology 324 243 (2017)
https://doi.org/10.1016/j.surfcoat.2017.05.085