Articles citing this article

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Cited article:

Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma

Espedito Vassallo, Miriam Saleh, Matteo Pedroni, Anna Cremona and Dario Ripamonti
Plasma 8 (1) 8 (2025)
https://doi.org/10.3390/plasma8010008

The Planar Multipole Resonance Probe: A Minimally Invasive Monitoring Concept for Plasma-Assisted Dielectric Deposition Processes

Dennis Pohle, Christian Schulz, Moritz Oberberg, Peter Awakowicz and Ilona Rolfes
IEEE Transactions on Microwave Theory and Techniques 68 (6) 2067 (2020)
https://doi.org/10.1109/TMTT.2020.2974835