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Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode
V. Stranak, J. Kratochvil, J. Olejnicek, P. Ksirova, P. Sezemsky, M. Cada and Z. Hubicka Journal of Applied Physics 121(17) (2017) https://doi.org/10.1063/1.4977825
Effect of discharge power on target poisoning and coating properties in reactive magnetron sputter deposition of TiN
Christian Saringer, Robert Franz, Katrin Zorn and Christian Mitterer Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34(4) (2016) https://doi.org/10.1116/1.4954949
Plasma‐Substrate Interaction during Plasma Deposition on Polymers
Elaboration of a wide range of TiO2micro/nanostructures by high power impulse inverted cylindrical magnetron sputtering
Elodie Lecoq, Jérôme Guillot, David Duday, Jean-Baptiste Chemin and Patrick Choquet Journal of Physics D: Applied Physics 47(19) 195201 (2014) https://doi.org/10.1088/0022-3727/47/19/195201
Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system
Z. Hubička, Š. Kment, J. Olejníček, M. Čada, T. Kubart, M. Brunclíková, P. Kšírová, P. Adámek and Z. Remeš Thin Solid Films 549 184 (2013) https://doi.org/10.1016/j.tsf.2013.09.031
The spatial distribution of negative oxygen ion densities in a dc reactive magnetron discharge
J. T. Gudmundsson, N. Brenning, D. Lundin and U. Helmersson Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30(3) (2012) https://doi.org/10.1116/1.3691832
Current–voltage–time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering discharge
Fridrik Magnus, Tryggvi K. Tryggvason, Sveinn Olafsson and Jon T. Gudmundsson Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30(5) (2012) https://doi.org/10.1116/1.4732735