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Cited article:

Thermal annealing effect on nitrogen-doped TiO2 thin films grown by high power impulse magnetron sputtering plasma power source

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Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode

V. Stranak, J. Kratochvil, J. Olejnicek, P. Ksirova, P. Sezemsky, M. Cada and Z. Hubicka
Journal of Applied Physics 121 (17) (2017)
https://doi.org/10.1063/1.4977825

Effect of discharge power on target poisoning and coating properties in reactive magnetron sputter deposition of TiN

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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34 (4) (2016)
https://doi.org/10.1116/1.4954949

Plasma diagnostics for understanding the plasma–surface interaction in HiPIMS discharges: a review

Nikolay Britun, Tiberiu Minea, Stephanos Konstantinidis and Rony Snyders
Journal of Physics D: Applied Physics 47 (22) 224001 (2014)
https://doi.org/10.1088/0022-3727/47/22/224001

Plasma‐Substrate Interaction during Plasma Deposition on Polymers

D. Hegemann, B. Hanselmann, N. Blanchard and M. Amberg
Contributions to Plasma Physics 54 (2) 162 (2014)
https://doi.org/10.1002/ctpp.201310064

Elaboration of a wide range of TiO2micro/nanostructures by high power impulse inverted cylindrical magnetron sputtering

Elodie Lecoq, Jérôme Guillot, David Duday, Jean-Baptiste Chemin and Patrick Choquet
Journal of Physics D: Applied Physics 47 (19) 195201 (2014)
https://doi.org/10.1088/0022-3727/47/19/195201

Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system

Z. Hubička, Š. Kment, J. Olejníček, et al.
Thin Solid Films 549 184 (2013)
https://doi.org/10.1016/j.tsf.2013.09.031

The spatial distribution of negative oxygen ion densities in a dc reactive magnetron discharge

Steven Scribbins, Michael Bowes and James W Bradley
Journal of Physics D: Applied Physics 46 (4) 045203 (2013)
https://doi.org/10.1088/0022-3727/46/4/045203

Current–voltage–time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering discharge

Fridrik Magnus, Tryggvi K. Tryggvason, Sveinn Olafsson and Jon T. Gudmundsson
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (5) (2012)
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High power impulse magnetron sputtering discharge

J. T. Gudmundsson, N. Brenning, D. Lundin and U. Helmersson
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (3) (2012)
https://doi.org/10.1116/1.3691832