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Cited article:

Evolution of high aspect ratio and nano-grass structures using a modified low plasma density reactive ion etching

M. Mehran, Z. Kolahdouz, Z. Sanaee, S. Azimi, S. Mohajerzadeh

Eur. Phys. J. Appl. Phys., 55 1 (2011) 11302

Published online: 2011-07-21

DOI: https://doi.org/10.1051/epjap/2011100362

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Deep Reactive Etching of Silica with SF6/H2 Plasma

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High sensitivity nanostructure incorporated interdigital silicon based capacitive accelerometer

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A novel non-sequential hydrogen-pulsed deep reactive ion etching of silicon

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Journal of Micromechanics and Microengineering 23 (9) 095014 (2013)
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