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All issues Volume 76 / No 1 (October 2016) Eur. Phys. J. Appl. Phys., 76 1 (2016) 10801 References
Issue
Eur. Phys. J. Appl. Phys.
Volume 76, Number 1, October 2016
Article Number 10801
Number of page(s) 12
Section Plasma, Discharges and Processes
DOI https://doi.org/10.1051/epjap/2016160125
Published online 10 October 2016
  1. M.J. Pavlovich, T. Ono, C. Galleher, B. Curtis, D.S. Clark, Z. Machala, D.B. Graves, J. Phys. D: Appl. Phys. 47, 505202 (2014) [CrossRef] [Google Scholar]
  2. B.M. Penetrante, M.C. Hsiao, B.T. Meritt, G.E. Vogtlin, P.H. Wallman, IEEE Trans. Plasma Sci. 23, 679 (1995) [CrossRef] [Google Scholar]
  3. H.-H. Kim, Plasma Process. Polym. 1, 91 (2004) [Google Scholar]
  4. S.C. Hill, L. Douglas Smoot, Progr. Energy Combust. Sci. 26, 417 (2000) [CrossRef] [Google Scholar]
  5. R. Weller, Clin. Exp. Dermatol. 28, 511 (2003) [CrossRef] [PubMed] [Google Scholar]
  6. D.B. Graves, J. Phys. D: Appl. Phys. 45, 263001 (2012) [CrossRef] [Google Scholar]
  7. J.H. Seinfeld, S. Pandis, Atmospheric Chemistry and Physics: From Air Pollution to Climate Change (Wiley, New York, 2006) [Google Scholar]
  8. A.F.H. van Gessel, K.M.J. Alards, P.J. Bruggeman, J. Phys. D: Appl. Phys. 46, 265202 (2013) [CrossRef] [Google Scholar]
  9. X.L. Deng, A.Yu. Nikiforov, P. Vanraes, Ch. Leys, J. Appl. Phys. 113, 023305 (2013) [CrossRef] [Google Scholar]
  10. A.V. Pipa, S. Reuter, R. Foest, K.-D. Weltmann, J. Phys. D: Appl. Phys. 45, 085201 (2012) [CrossRef] [Google Scholar]
  11. M. Castillo, I. Méndez, V.J. Herrero, I. Tanarro, Plasma Source. Sci. Technol. 13, 343 (2004) [CrossRef] [Google Scholar]
  12. M. Castillo, V.J. Herrero, I. Méndez, I. Tanarro, Plasma Source. Sci. Technol. 13, 39 (2004) [CrossRef] [Google Scholar]
  13. M. Castillo, I. Méndez, A.M. Islyaikin, V.J. Herrero, I. Tanarro, J. Phys. Chem. A 109, 6255 (2005) [CrossRef] [PubMed] [Google Scholar]
  14. B.F. Gordiets, C.M. Ferreira, V.L. Guerra, J.M.A.H. Loureiro, J. Nahorny, D. Pagnon, M. Touzeau, M. Vialle, IEEE Trans. Plasma Sci. 23, 750 (1995) [CrossRef] [Google Scholar]
  15. V. Guerra, J. Loureiro, J. Phys. D: Appl. Phys. 28, 1903 (1995) [CrossRef] [Google Scholar]
  16. V. Guerra, J. Loureiro, J. Phys. D: Appl. Phys. 6, 373 (1997) [Google Scholar]
  17. L.V. Gatilova, K. Allegraud, J. Guillon, Y.Z. Ionikh, G. Cartry, J. Röpcke, A. Rousseau, Plasma Source. Sci. Technol. 16, S107 (2007) [CrossRef] [Google Scholar]
  18. S. Welzel, L. Gatilova, J. Röpcke, A. Rousseau, Plasma Source. Sci. Technol. 16, 822 (2007) [CrossRef] [Google Scholar]
  19. S. Welzel, O. Guaitella, C. Lazzaroni, C.D. Pintassilgo, A. Rousseau, J. Röpcke, Plasma Source. Sci. Technol. 20, 015020 (2011) [CrossRef] [Google Scholar]
  20. Y. Ionikh, A.V. Meshchanov, J. Röpcke, A. Rousseau, Chem. Phys. 322, 411 (2006) [CrossRef] [Google Scholar]
  21. A.D. Montello, Z. Yin, D. Burnette, I.V. Adamovich, W.R. Lempert, J. Phys. D: Appl. Phys. 46, 464002 (2013) [CrossRef] [Google Scholar]
  22. D. Burnette, A. Montello, I.V. Adamovich, W.R. Lempert, Plasma Source. Sci. Technol. 23, 045007 (2014) [CrossRef] [Google Scholar]
  23. I. Shkurenkov, D. Burnette, W.R. Lempert, I.V. Adamovich, Plasma Source. Sci. Technol. 23, 065003 (2014) [CrossRef] [Google Scholar]
  24. I. Orlandini, U. Riedel, J. Phys. D: Appl. Phys. 33, 2467 (2000) [CrossRef] [Google Scholar]
  25. R. Dorai, M.J. Kushner, J. Phys. D: Appl. Phys. 35, 2954 (2002) [CrossRef] [Google Scholar]
  26. D. Marinov, O. Guaitella, A. Rousseau, Y. Ionikh, J. Phys. D: Appl. Phys. 43, 115203 (2010) [CrossRef] [Google Scholar]
  27. O. Guaitella, M. Hubner, S. Welzel, D. Marinov, J. Röpcke, A. Rousseau, Plasma Source. Sci. Technol. 19, 045026 (2010) [CrossRef] [Google Scholar]
  28. V. Guerra, D. Marinov, O. Guaitella, A. Rousseau, J. Phys. D: Appl. Phys. 47, 224012 (2014) [CrossRef] [Google Scholar]
  29. C.D. Pintassilgo, J. Loureiro, V. Guerra, J. Phys. D: Appl. Phys. 38, 417 (2005) [CrossRef] [Google Scholar]
  30. C.D. Pintassilgo, O. Guaitella, A. Rousseau, Plasma Source. Sci. Technol. 18, 025005 (2009) [Google Scholar]
  31. C.D. Pintassilgo, V. Guerra, O. Guaitella, A. Rousseau, Plasma Source. Sci. Technol. 23, 025006 (2014) [CrossRef] [Google Scholar]
  32. C.D. Pintassilgo, V. Guerra, Plasma Source. Sci. Technol. 24, 055009 (2015) [CrossRef] [Google Scholar]
  33. M. Simek, P.F. Ambrico, S. De Benedictis, G. Dilecce, V. Prukner, J. Schmidt, J. Phys. D: Appl. Phys. 43, 124003 (2010) [CrossRef] [Google Scholar]
  34. A.M. Pointu, E. Mintusov, P. Fromy, Plasma Source. Sci. Technol. 19, 015018 (2010) [Google Scholar]
  35. L.G. Piper, J. Chem. Phys. 87, 1625 (1987) [CrossRef] [Google Scholar]
  36. F. Fresnet, G. Baravian, L. Magne, S. Pasquiers, C. Postel, V. Puech, A. Rousseau, Appl. Phys. Lett. 77, 4118 (2000) [CrossRef] [Google Scholar]
  37. O. Eichwald, M. Yousfi, A. Hennad, M.D. Benabdessadok, J. Appl. Phys. 82, 4781 (1997) [CrossRef] [Google Scholar]
  38. A. Fridman, Plasma Chemistry (Cambridge University Press, New York, 2008) [CrossRef] [Google Scholar]
  39. N.A. Popov, J. Phys D: Appl. Phys. 44, 285201 (2011) [Google Scholar]
  40. A. Lofthus, P.H. Krupenie, J. Phys. Chem. Ref. Data 6, 113 (1977) [Google Scholar]
  41. S.L. Rothman et al., J. Quant. Spectrosc. Radiat. Transfer 96, 139 (2005) [Google Scholar]
  42. S.L. Rothman et al., J. Quant. Spectrosc. Radiat. Transfer 60, 665 (1998) [Google Scholar]
  43. V. Guerra, P.A. Sá, J. Loureiro, Eur. Phys. J. Appl. Phys. 28, 125 (2004) [CrossRef] [EDP Sciences] [Google Scholar]
  44. V. Guerra, E. Tatarova, F.M. Dias, C.M. Ferreira, J. Appl. Phys. 91, 2648 (2002) [CrossRef] [Google Scholar]
  45. V. Laporta, R. Celiberto, J.M. Wadehra, Plasma Source. Sci. Technol. 21, 055018 (2012) [CrossRef] [Google Scholar]
  46. M. Capitelli, C.M. Ferreira, B.F. Gordiets, A.I. Osipov, Plasma Kinetics in Atmospheric Gases (Springer-Verlag, Berlin, Heidelberg, 2000) [CrossRef] [Google Scholar]
  47. L.G. Piper, L.M. Cowles, W.T. Rawlins, J. Chem. Phys. 85, 3369 (1986) [CrossRef] [Google Scholar]
  48. A. Ricard, S.-G. Oh, V. Guerra, Plasma Source. Sci. Technol. 22, 035009 (2013) [Google Scholar]
  49. C.L. da Silva, V.P. Pasko, J. Geophys. Res. Atmos. 118, 13561 (2013) [CrossRef] [Google Scholar]
  50. N.A. Popov, Plasma Phys. Rep. 27, 886 (2001) [CrossRef] [Google Scholar]
  51. J.P. Boeuf, E.E. Kunhardt, J. Appl. Phys. 60, 915 (1986) [CrossRef] [Google Scholar]
  52. Et. Es-sebbar, Y. Benilan, A. Jolly, M.-C. Gazeau, J. Phys. D: Appl. Phys. 42, 135206 (2009) [CrossRef] [Google Scholar]
  53. C.D. Pintassilgo, Plasma Source. Sci. Technol. 21, 035020 (2012) [CrossRef] [Google Scholar]

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