| Issue |
Eur. Phys. J. Appl. Phys.
Volume 75, Number 2, August 2016
6th Central European Symposium on Plasma Chemistry (CESPC-6)
|
|
|---|---|---|
| Article Number | 24712 | |
| Number of page(s) | 5 | |
| Section | Plasma, Discharges and Processes | |
| DOI | https://doi.org/10.1051/epjap/2016150564 | |
| Published online | 08 August 2016 | |
- M. Laroussi, T. Akan, Plasma Processes Polym. 4, 777 (2007) [Google Scholar]
- A. Schutze, J.Y. Jeong, S.E. Babayan, J. Park, G.S. Selwyn, R.F. Hicks, IEEE Trans. Plasma Sci. 26, 1685 (1998) [CrossRef] [Google Scholar]
- Y. Bartosiewicz, P. Proulx, Y. Mercadier, J. Phys. D: Appl. Phys. 35, 2139 (2002) [CrossRef] [Google Scholar]
- C.C. Hsu, Y.J. Yang, IEEE Trans. Plasma Sci. 38, 496 (2010) [CrossRef] [Google Scholar]
- N. Mericam-Bourdet, M. Laroussi, A. Begum, E. Karakas, J. Phys. D: Appl. Phys. 42, 7 (2009) [CrossRef] [Google Scholar]
- I. Onyshchenko, N. De Geyter, A.Y. Nikiforov, R. Morent, Plasma Processes Polym. 12, 271 (2015) [CrossRef] [Google Scholar]
- A. Lehmann, A. Rueppell, A. Schindler, I.M. Zylla, H.J. Seifert, F. Nothdurft, M. Hannig, S. Rupf, Plasma Processes Polym. 10, 262 (2013) [CrossRef] [Google Scholar]
- J.F. Kolb, A.A.H. Mohamed, R.O. Price, R.J. Swanson, A. Bowman, R.L. Chiavarini, M. Stacey, K.H. Schoenbach, Appl. Phys. Lett. 92, 3 (2008) [Google Scholar]
- J.L. Walsh, F. Iza, N.B. Janson, V.J. Law, M.G. Kong, J. Phys. D: Appl. Phys. 43, 14 (2010) [Google Scholar]
- S. Pellerin, J.M. Cormier, F. Richard, K. Musiol, J. Chapelle, J. Phys. D: Appl. Phys. 29, 726 (1996) [NASA ADS] [CrossRef] [Google Scholar]
- S. Hofmann, A.F.H. van Gessel, T. Verreycken, P. Bruggeman, Plasma Source. Sci. Technol. 20, 12 (2011) [Google Scholar]
- N. Puač, D. Maletić, S. Lazović, G. Malović, A. Đorđević, Z.L. Petrović, Appl. Phys. Lett. 101, 024103 (2012) [CrossRef] [Google Scholar]
- O. Guaitella, A. Sobota, J. Phys. D: Appl. Phys. 48, 12 (2015) [CrossRef] [Google Scholar]
- I. Onyshchenko, A.Y. Nikiforov, N. De Geyter, R. Morent, Plasma Processes Polym. 12, 466 (2015) [CrossRef] [Google Scholar]
- J.L. Walsh, M.G. Kong, IEEE Trans. Plasma Sci. 39, 2306 (2011) [CrossRef] [Google Scholar]
- S. Wu, H. Xu, Y. Xian, Y. Lu, X. Lu, AIP Adv. 5, 7 (2015) [Google Scholar]
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