Issue
Eur. Phys. J. Appl. Phys.
Volume 71, Number 2, August 2015
The 14th International Symposium on High Pressure Low Temperature Plasma Chemistry (HAKONE XIV)
Article Number 20802
Number of page(s) 16
Section Plasma, Discharges and Processes
DOI https://doi.org/10.1051/epjap/2015140518
Published online 15 July 2015
  1. P. Bruggeman, C. Leys, J. Phys. D: Appl. Phys. 42, 053001 (2009) [CrossRef] [Google Scholar]
  2. R.P. Joshi, S.M. Thagard, Plasma Chem. Plasma Process. 33, 1 (2013) [CrossRef] [Google Scholar]
  3. T.M.P. Briels, E.M. Van Veldhuizen, U. Ebert, J. Phys. D: Appl. Phys. 41, 234008 (2008) [CrossRef] [Google Scholar]
  4. R.P. Joshi, J.F. Kolb, S. Xiao, K.H. Schoenbach, Plasma Processes Polym. 6, 763 (2009) [CrossRef] [Google Scholar]
  5. P.H. Ceccato, O. Guaitella, M.R. Le Gloahee, A. Rousseau, J. Phys. D: Appl. Phys. 43, 175202 (2010) [CrossRef] [Google Scholar]
  6. X.Q. Wen, G.S. Liu, Z.F. Ding, IEEE Trans. Plasma Sci. 38, 1758 (2011) [CrossRef] [Google Scholar]
  7. H. Fujita, S. Kanazawa, K. Ohtani, A. Komiya, T. Sato, J. Appl. Phys. 113, 113304 (2013) [CrossRef] [Google Scholar]
  8. A. Starikovskiy, Y. Yang, Y.I. Cho, A. Fridman, Plasma Source. Sci. Technol. 20, 024003 (2011) [Google Scholar]
  9. A. Starikovskiy, Plasma Source. Sci. Technol. 22, 012001 (2013) [CrossRef] [Google Scholar]
  10. I. Marinov, S. Starikovskaia, A. Rousseau, J. Phys. D: Appl. Phys. 47, 224017 (2014) [CrossRef] [Google Scholar]
  11. W. An, K. Baumung, H. Bluhm, J. Appl. Phys. 101, 053302 (2007) [CrossRef] [Google Scholar]
  12. X.Q. Wen, S.H. Li, J.Y. Liu, Z.W. Niu, Appl. Phys. Lett. 105, 084104 (2014) [CrossRef] [Google Scholar]
  13. T. Namihira, S. Sakai, T. Yamaguchi, K. Yamamoto, C. Yamada, T. Kiyan, T. Sakugawa, S. Katsuki, H. Akiyama, IEEE Trans. Plasma Sci. 35, 614 (2007) [CrossRef] [Google Scholar]
  14. J.R. Woodworth, E. Barnat, B. Aragon, J. Corley, K. Hodge, J. Blickem, V. Anaya, D. Guthrie, D. Bliss, J. Lehr, J.E. Maenchen, P. Wakeland, S. Drennan, D.L. Johnson, IEEE Trans. Plasma Sci. 35, 1797 (2007) [CrossRef] [Google Scholar]
  15. M. Simek, M. Clupek, V. Babicky, P. Lukes, P. Sunka, Plasma Source. Sci. Technol. 21, 055031 (2012) [CrossRef] [Google Scholar]
  16. K. Tachibana, H. Motomura, in Proc. 21st International Symposium on Plasma Chemistry (Cairns, Australia, 2013), ID425 [Google Scholar]
  17. G.S. Sarkisov, N.D. Zameroski, J.R. Woodworth, J. Appl. Phys. 99, 083304 (2006) [CrossRef] [Google Scholar]
  18. T.J. Lewis, IEEE Trans. Dielectr. Electr. Insul. 5, 306 (1998) [CrossRef] [Google Scholar]
  19. R.P. Joshi, J. Qian, G. Zhao, J. Kolb, K.H. Schoenbach, E. Schamiloglu, J. Gaudet, J. Appl. Phys. 96, 5129 (2004) [CrossRef] [Google Scholar]
  20. M. Kim, R.E. Hebner, G.A. Hallock, IEEE Trans. Dielectr. Electr. Insul. 15, 547 (2008) [CrossRef] [Google Scholar]
  21. E.M. Van Veldhuizen, W.R. Rutgers, J. Phys. D: Appl. Phys. 35, 2169 (2002) [CrossRef] [Google Scholar]
  22. E.M. Van Veldhuizen, W.R. Rutgers, J. Phys. D: Appl. Phys. 36, 2692 (2003) [CrossRef] [Google Scholar]
  23. R. Ono, T. Oda, J. Phys. D: Appl. Phys. 36, 21952 (2003) [Google Scholar]
  24. T. Ohkubo, S. Kanazawa, Y. Nooto, M. Kocik, J. Mizeraczyk, J. Adv. Oxid. Technol. 8, 218 (2005) [Google Scholar]
  25. T.M. Briels, J. Kos, G.J. Winands, E.M. Van Veldhuizen, U. Ebert, J. Phys. D: Appl. Phys. 41, 234004 (2008) [CrossRef] [Google Scholar]
  26. R. Ono, Y. Teramoto, T. Oda, J. Phys. D: Appl. Phys. 43, 345203 (2010) [CrossRef] [Google Scholar]
  27. K. Adamiak, P. Atten, J. Electrostat. 61, 85 (2004) [CrossRef] [Google Scholar]
  28. U. Ebert, C. Montijn, T.M. Bries, W. Hundsdorfer, B. Muelenbroek, E.M. Van Veldhuizen, Plasma Source. Sci. Technol. 15, S118 (2006) [CrossRef] [Google Scholar]
  29. K. Yanallah, F. Pontiga, Plasma Source. Sci. Technol. 21, 045007 (2012) [CrossRef] [Google Scholar]
  30. M. Akyuz, A. Larsson, V. Cooray, G. Strandberg, J. Electrostat. 59, 115 (2003) [CrossRef] [Google Scholar]
  31. A. Luque, U. Ebert, New J. Physics 16, 013039 (2014) [CrossRef] [Google Scholar]
  32. E.M. Van Veldhuizen, W.R. Rutgers, in Proc. 15th International Symposium on Plasma Chemistry (Orleans, France, 2001), p. 3245 [Google Scholar]
  33. H.R. Griem, Spectral Line Broadening by Plasmas (Academic Press, New York, 1974), p. 316 [Google Scholar]
  34. http://www.sri.com/engage/products-solutions/lifbase [Google Scholar]
  35. E. Marode, J. Appl. Phys. 46, 2005 (1975) [CrossRef] [Google Scholar]
  36. K. Tachibana, Y. Takekata, Y. Mizumoto, H. Motomura, M. Jinno, Plasma Source. Sci. Technol. 20, 034005 (2011) [CrossRef] [Google Scholar]
  37. P.P. Sainct, D.A. Lacoste, M.J. Kirkpatrick, E. Odic, C.O. Laux, J. Phys. D: Appl. Phys. 47, 075204 (2014) [CrossRef] [Google Scholar]
  38. M. Aints, K. Kudu, A. Haljaste, T. Plank, J. Phys. D: Appl. Phys. 34, 905 (2001) [CrossRef] [Google Scholar]
  39. http://www.comsol.com [Google Scholar]
  40. K.H. Schoenbach, J. Kolb, S. Xiao, S. Katsuki, Y. Minamitani, R. Joshi, Plasma Source. Sci. Technol. 17, 024010 (2008) [CrossRef] [Google Scholar]
  41. A. Shashurin, M.N. Shneider, M. Keidar, Plasma Source. Sci. Technol. 21, 034006 (2012) [Google Scholar]
  42. http://fr.lxcat.net/home [Google Scholar]

Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.

Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.

Initial download of the metrics may take a while.