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Issue Eur. Phys. J. Appl. Phys.
Volume 15, Number 3, September 2001
Page(s) 153 - 165
Section Surfaces, Thin Foils and Nanomaterials
DOI 10.1051/epjap:2001177

DOI: 10.1051/epjap:2001177

Eur. Phys. J. AP 15, 153-165 (2001)

Orientation control of rhomboedral PZT thin films on Pt/Ti/SiO $\mathsf{_2}$/Si substrates

B. Vilquin, R. Bouregba, G. Poullain, M. Hervieu and H. Murray

Laboratoire CRISMAT/ISMRA et Université de Caen (CNRS UMR 6508) , 6 boulevard du Maréchal Juin, 14050 Caen Cedex, France

bertrand.vilquin@ismra.fr

(Received: 19 February 2001 / Revised: 4 April 2001 / Accepted: 1 June 2001)

Abstract
Highly (111)- and (001)-oriented rhomboedral PZT thin films have been grown at 500 °C on platinized silicon substrates by in situ RF magnetron sputtering. Crystallization of the perovskite phase was possible provided that a thin TiOx buffer layer was deposited prior to the PZT. Control of PZT films orientation is demonstrated by changing the $\rm O_2/(Ar+O_2)$ ratio in the plasma gas during the TiOx sputtering and its consequences on electrical properties of the ferroelectric samples are presented. The structural properties of the TiOx buffer layer were studied by means of transmission electronic microscopy in order to understand the relation between the TiOx seeding and the orientation control of the PZT film.

PACS
81.15.Cd - Deposition by sputtering.
77.84.-s - Dielectric, piezoelectric, ferroelectric, and antiferroelectric materials.
68.37.Lp - Transmission electron microscopy (TEM) (including STEM, HRTEM, etc.).


© EDP Sciences 2001


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