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DOI: 10.1051/epjap:1998200
Eur. Phys. J. AP 3, 29-33
Microscale friction investigation of polysilicon surface using scanning force microscopy
C. Flueraru1 - C. Cobianu1 - D. Dascalu1 - M. Flueraru2
1 Institute of Microtechnology, PO Box 38-160, Bucharest 72225, Romania
2 Department for Organic Chemistry,
University of Bucharest, Bld. Carol 13, Bucharest, Romania
Received: 7 November 1996 / Revised: 1st April 1998 / Accepted: 6 April 1998
Abstract
Microscale phenomena between the surface of chemically vapour deposited silicon films and a
silicon nitride tip was investigated using Scanning Force Microscopy. An analysis of friction
forces for different scan directions is presented. For different applied forces, the friction forces
were measured and consequently the friction coefficient was calculated. We found that the
average friction force linearly increases with the applied force and is reversible when unloading.
Connection between the surface roughness and the friction coefficient was experimentally
demonstrated.
Résumé
On a étudié par Microscopie à Force Atomique des phénomènes
à échelle microscopique au
niveau de la jonction pointe de nitrure
de silicium et surface de films de silicium, obtenus par
déposition chimique en phase vapeur.
Dans cet article, nous présentons une analyse des forces de
friction pour différentes directions de balayage. On a déterminé
les forces de friction et, en
conséquence, nous avons calculé le coefficient de friction
pour différentes forces appliquées. Les
résultats montrent que la force moyenne de
friction augmente en fonction de la force appliquée, et
qu'elle est reversible lorsque la charge diminue.
Une dépendance entre la rugosité de la surface et
le coefficient de friction est déduite.
PACS
07.79.-v Scanning probe microscopes, components and techniques -
68.35.Bs Surface structure and topography
Author for correspondance: cflueraru@imt.ro
Copyright EDP Sciences
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