Issue Eur. Phys. J. Appl. Phys. Volume 47, Number 2, August 2009 11th International Symposium on High Pressure, Low Temperature Plasma Chemistry (HAKONE XI) Article Number 22812 Number of page(s) 6 Section 11th International Symposium on High Pressure, Low Temperature Plasma Chemistry (HAKONE XI) DOI 10.1051/epjap/2009063 Published online 17 April 2009

Eur. Phys. J. Appl. Phys. 47, 22812 (2009)
DOI: 10.1051/epjap/2009063

Influence of humidity on photochemical ozone generation with 172 nm xenon excimer lamps

M.J. Salvermoser¹, U. Kogelschatz² and D.E. Murnick<sup>3

1</sup>  Scientific Advisor to UV Solutions, Newark, NJ 07103, USA
²  Retired from ABB Corporate Research, 5405 Baden, Switzerland
³  Department of Physics, Rutgers University, Newark, NJ 07102, USA

msalvermoser@yahoo.com

Received: 19 December 2008 / Accepted: 23 January 2009 / Published online: 17 April 2009

Abstract
The reaction kinetics of photochemical ozone (O₃) generation in humid air and oxygen (O₂) using efficient, narrow band vacuum ultra violet (VUV) 172 nm xenon excimer lamps is discussed. Trace amounts of water (H₂O) vapor in the process gas leads to hydroxyl (OH) and hydroperoxy (HO₂) radical formation. These radicals drive a catalytic O₃ destruction cycle limiting O₃ saturation concentration. This catalytic O₃ destruction cycle was included into a quantitative kinetic model describing photochemical O₃ production. Experimental O₃ saturation concentrations obtained with coaxial VUV driven photochemical O₃ generators compare satisfactorily with the models predictions.

PACS
82.30.Cf - Atom and radical reactions; chain reactions; molecule-molecule reactions.
82.50.Hp - Processes caused by visible and UV light.
82.50.Nd - Control of photochemical reactions.

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