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Eur. Phys. J. Appl. Phys. 37, 53-55 (2007)
DOI: 10.1051/epjap:2006126
Synthesis of one-dimensional GaN nanorods on Si(111) substrates by magnetron sputtering
Shoubin Xue, Huizhao Zhuang, Chengshan Xue and Lijun HuInstitute of Semiconductor, Shandong Normal University, Jinan 250014, P.R. China
zhuanghuizhao@sdnu.edu.cn
(Received: 23 July 2006 / Received in final form: 31 July 2006 / Accepted: 1 September 2006 / Published online: 8 November 2006 )
Abstract
GaN nanorods have been successfully synthesized on Si(111) substrates by
magnetron sputtering through ammoniating the Ga2O3/ZnO films at
950
C in a quartz tube. The GaN nanorods have been characterized by
X-ray diffraction (XRD), scanning electron microscopy (SEM), field-emission
transmission electron microscope (FETEM), Fourier transform infrared (FTIR)
system and fluorescence spectrophotometer. The results show that the
nanorods are pure hexagonal GaN wurtzite structure with lengths of about
several micrometers and diameters ranging from 100 nm to 750 nm, and the
growth direction of GaN nanorods is perpendicular to (101) plane. The
photoluminescence (PL) spectrum indicates that the good emission property
for the nanorods. Finally, the growth mechanism is also briefly discussed.
68.65.-k - Low-dimensional, mesoscopic, and nanoscale systems: structure and nonelectronic properties.
78.30.Fs - III-V and II-VI semiconductors.
81.15.Cd - Deposition by sputtering.
© EDP Sciences 2006
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