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This article has an erratum:
[erratum]
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Eur. Phys. J. Appl. Phys. 32, 155-158 (2005)
DOI: 10.1051/epjap:2005089
All the physical and electrical parameters
of the MOS transistor on a single graph (Q
G. Vincent Département de Physique, Université Joseph Fourier, Grenoble, France Laboratoire de Technologie de la Microélectronique, 17 avenue des Martyrs, 38054 Grenoble 9, France
gilbert.belledonne@wanadoo.fr
(Received: 24 May 2005 / Accepted: 25 October 2005 / Published online: 14 December 2005 )
Abstract
A single and simple graph is proposed, to visualize the impact of all the
numerous parameters playing a role in the metal-oxide-semiconductor (MOS)
transistor characteristics: doping and permittivity of the semiconductor,
thickness, permittivity and charge of the oxide, temperature, and finally
gate, drain and substrate voltages. In addition, MOS structure and
capacitance properties are presented.
85.30.Tv - Field effect devices.
85.40.-e - Microelectronics: LSI, VLSI, ULSI; integrated circuit fabrication technology.
85.30.De - Semiconductor-device characterization, design, and modeling.
73.40.Qv - Metal-insulator-semiconductor structures (including semiconductor-to-insulator).
© EDP Sciences 2005
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