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Eur. Phys. J. Appl. Phys. 46, 12506 (2009)
DOI: 10.1051/epjap/2009028
OVPD
technology
N. Meyer1, M. Rusu2, S. Wiesner2, S. Hartmann3, D. Keiper1, M. Schwambera1, M. Gersdorff1, M. Kunat1, M. Heuken1, W. Kowalsky3 and M.Ch. Lux-Steiner2 1 AIXTRON AG, Kackertstr. 15-17, 52072 Aachen, Germany
2 Solarenergieforschung (SE2), Helmholtz-Zentrum Berlin für Materialien und Energie, Germany
3 TU Braunschweig, Schleinitzstraße 22, 38106 Braunschweig, Germany
Meyer@aixtron.com
Received: 20 October 2008 / Accepted: 23 January 2009 / Published online: 27 March 2009
Abstract
The precise control of organic thin film processing by
organic vapor phase deposition (OVPD
) is presented and
analyzed on device level. OVPD
offers accurate and individual control of
deposition layer properties like mixing of several materials (co-deposition)
and the control of various morphologies by a wide process parameter space
given by, e.g. substrate temperature, deposition rate and pressure. The
benefit of precise co-deposition is demonstrated by an OLED with a sensitive
twofold-doped emissive layer and revealed a doping level of 0.26% for the
red dopant with a std. dev. of 0.38%. The effect of the various
morphologies is investigated by optimizing the efficiency of molecular
organic solar cells consisting of copper phthalocyanine (CuPc) and C60.
With defined process parameters efficiencies of up to 3.0% were
demonstrated.
78.66.Qn - Polymers; organic compounds.
84.60.Jt - Photoelectric conversion: solar cells and arrays.
72.80.Le - Polymers; organic compounds.
© EDP Sciences 2009
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