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Issue Eur. Phys. J. Appl. Phys.
Volume 47, Number 2, August 2009
11th International Symposium on High Pressure, Low Temperature Plasma Chemistry (HAKONE XI)
Article Number 22812
Number of page(s) 6
Section 11th International Symposium on High Pressure, Low Temperature Plasma Chemistry (HAKONE XI)
DOI 10.1051/epjap/2009063
Published online 17 April 2009

Eur. Phys. J. Appl. Phys. 47, 22812 (2009)
DOI: 10.1051/epjap/2009063

Influence of humidity on photochemical ozone generation with 172 nm xenon excimer lamps

M.J. Salvermoser1, U. Kogelschatz2 and D.E. Murnick3

1  Scientific Advisor to UV Solutions, Newark, NJ 07103, USA
2  Retired from ABB Corporate Research, 5405 Baden, Switzerland
3  Department of Physics, Rutgers University, Newark, NJ 07102, USA

msalvermoser@yahoo.com

Received: 19 December 2008 / Accepted: 23 January 2009 / Published online: 17 April 2009

Abstract
The reaction kinetics of photochemical ozone (O3) generation in humid air and oxygen (O2) using efficient, narrow band vacuum ultra violet (VUV) 172 nm xenon excimer lamps is discussed. Trace amounts of water (H2O) vapor in the process gas leads to hydroxyl (OH) and hydroperoxy (HO2) radical formation. These radicals drive a catalytic O3 destruction cycle limiting O3 saturation concentration. This catalytic O3 destruction cycle was included into a quantitative kinetic model describing photochemical O3 production. Experimental O3 saturation concentrations obtained with coaxial VUV driven photochemical O3 generators compare satisfactorily with the models predictions.

PACS
82.30.Cf - Atom and radical reactions; chain reactions; molecule-molecule reactions.
82.50.Hp - Processes caused by visible and UV light.
82.50.Nd - Control of photochemical reactions.

© EDP Sciences 2009


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