14th International Colloquium on Plasma Processes (CIP 2003)
Issue
Eur. Phys. J. Appl. Phys.
Volume 26, Number 3, June 2004
14th International Colloquium on Plasma Processes (CIP 2003)
Page(s) 195 - 201
Section Plasma, Discharges and Processes
DOI http://dx.doi.org/10.1051/epjap:2004031
Published online 07 April 2004

© EDP Sciences, 2004

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