Institut des Matériaux Jean Rouxel, IMN Nantes, 2 rue de la Houssinière, BP 32229, 44322 Nantes Cedex, France
This paper presents a novel dual plasma enhanced chemical vapor deposition (PECVD) process developed to grow carbon nitride nanofibres (CN-NFs) at room temperature (RT) and its basic version used to grow multi-walled carbon nanotubes (MWCNTs) at temperatures as low as 550 °C. The dual process alternates two low pressure-high density plasmas, one inductively coupled (ICP) and the other one excited by distributed electron cyclotron resonance (DECR). MWCNTs can be synthesized using only the DECR plasma source. The paper focuses on the comparison between CN-NFs and MWCNTs detailing their structure as revealed by transmission electron microscopy (TEM), X-ray photo electron spectroscopy (XPS) and Raman spectroscopy.
(Received February 6 2006)
(Revised March 16 2006)
(Accepted March 24 2006)
(Online publication May 25 2006)